SPC150 Plasma Cleaner

It features three gas path Mass Flow Controllers (MFCs) for accurate gas flow control. The remote RF ion source generates a mild plasma, allowing for the effective removal of organic and silicon contaminants from samples and sample rods, while also facilitating surface activation and hydrophilization.

Key Features:

• Precise Gas Flow Control: Equipped with three gas path MFCs for accurate regulation of gas flow, ensuring consistent and effective cleaning.

• Gentle Plasma Treatment: The RF ion source produces a mild plasma, making it ideal for delicate and sensitive materials, while minimizing the risk of damage.

• Efficient Cleaning Mechanism: A grid between the ion source and the sample chamber enhances cleaning by preventing direct plasma bombardment, protecting fragile samples.

• Touchscreen Automatic Control: Features an intuitive touchscreen interface for easy operation with a plug-and-play setup.

• Specialized Applications: Particularly suitable for cleaning hydrocarbon and silicon contamination from ultrathin carbon films and for plasma treatment of fragile TEM specimens.

The SPC150 offers precise and reliable cleaning, making it an excellent choice for laboratories handling sensitive and delicate samples.